Negative electron resist. Prepn and characterization: L. F. Thompson et al., Tech. Pap. Reg. Tech Conf. Soc. Plast. Eng. 1973, (Oct.) 127. Molecular parameters and lithographic performance: L. F. Thompson et al., J. Vac. Sci. Technol. 12, 1280 (1975). Radiation chemistry: E. D. Feit et al., ACS Org. Coat. Plast. Chem. 35, 287 (1975). Use as matrix for deep UV resist materials: C. Kutal, S. K. Weit, J. Coat. Technol. 62, 63 (1990); S. K. Weit et al., Chem. Mater. 4, 453 (1992).